In this work, an experimental research on a low voltage DC magnetron plasma sputtering (0-650) volt is used for coating gold on a glass substrate at a constant pressure of argon gas 0.2 mbar and deposition time of 30 seconds. We focused on the effects of operating conditions for the system such as, electrode separation and sputtering current on coated samples under the influence of magnetic flux. Electron temperature and electrons and ions densities are determined by a cylindrical single Langmuir probe. The results show the sensitivity of electrode separation lead to change the plasma parameters. Furthermore, the surface morphology of gold coated samples at different electrode separation and sputtering current were studied by atomic force microscopy (AFM). The AFM analysis showed that the variation of average grain diameter and average grain height is nonlinear with a minimum value of average grain diameter 90 nm at electrode separation of 4 cm and 30 mA sputtering current.
The influence of the reaction gas composition during the DC magnetron sputtering process on the structural, chemical and optical properties of Ce-oxide thin films was investigated. X-ray diffraction (XRD) studies confirmed that all thin films exhibited a polycrystalline character with cubic fluorite structure for cerium dioxide. X-ray photoelectron spectroscopy (XPS) analyses revealed that cerium is present in two oxidation states, namely as CeO2 and Ce2O3, at the surface of the films prepared at oxygen/argon flow ratios between 0% and 7%, whereas the films are completely oxidized into CeO2 as the aforementioned ratio increases beyond 14%. Various optical parameters for the thin films (including an optical band gap in the range of 2.25–3.
... Show MoreIn this work, metal oxides nanostructures, mainly, copper oxide (CuO), nickel oxide (NiO), titanium dioxide (TiO2), and multilayer structure were synthesized by dc reactive magnetron sputtering technique. The structural purity and nanoparticle size of the prepared nanostructures were determined. The individual metal oxide samples (CuO, NiO and TiO2) showed high structural purity and minimum particle sizes of 34, 44, 61 nm, respectively. As well, the multilayer structure showed high structural purity as no elements or compounds other than the three oxides were founds in the final sample while the minimum particle size was 18 nm. This reduction in nanoparticle size can be considered as an advantage for the dc reactive magnetron sputtering tec
... Show MoreThis research studies the effect of grain size for the final stage in sintering Al2O3 .The experimental results for α- Al2O3 powder are modeled using ( L2-Regression ) technique in order to study the effect grain size distribution on densification rate using four kinds for the initial particle size which were ( 1.44 , 2.54 , 0.7-2.54 ,1.15-3.53 ) µm , and for sintering time (0-241) min. The mathematical simulation for grain size changing shows that the densification rates boots up as the grain size goes lower, this was due to the increase of contact area between the grains.
In this research the effect of grain size and effect of La2O3 doping on densification rate for the initial and intermediate stages of sintering were studied .The experimental results for α – cristobilite powder are modeled using ( L2-Regression ) technique in studying the effect of grain size and La2O3 doping using three particles size (6.12, 8.92, 13.6 ) µm, with undoped initial powder and with La2O3 doping . The mathematical simulation showes that the densification rates increase as the initial particles sizes decrease and vice versa. This shows that the densification depends directly on the initial compact density which reflects the contacts area between the particles . How
... Show MoreIn this paper, we investigate the basic characteristics of "magnetron sputtering plasma" using the target V2O5. The "magnetron sputtering plasma" is produced using "radio frequency (RF)" power supply and Argon gas. The intensity of the light emission from atoms and radicals in the plasma measured by using "optical emission spectrophotometer", and the appeared peaks in all patterns match the standard lines from NIST database and employed are to estimate the plasma parameters, of computes electron temperature and the electrons density. The characteristics of V2O5 sputtering plasma at multiple discharge provisos are studied at the "radio frequency" (RF) power ranging from 75 - 150 Wat
... Show MoreIn the present work, a D.C. magnetron sputtering system was
designed and fabricated. This chamber of this system includes two
coaxial cylinders made from copper .the inner one used as a cathode
while the outer one used as a node. The magnetic coils located on
the outer cylinder (anode) .The profile of magnetic field for various
coil current (from 2Amp to 14Amp) are shown. The effect of
different magnetic field on the Cu thin films thickness at constant
pressure of 7x10-5mbar is investigated. The result shown that, the
electrical behavior of the discharge strongly depends on the values
of the magnetic field and shows an optimum value at which the
power absorbed by the plasma is maximum. Furthermore, the
pl
In this paper, the effect of iron oxide nanoparticles dust (Fe2O3 NPs) on the parameters of DC electric discharge plasma under vacuum in argon gas was studied with the presence of a mirror magnetron behind the electrodes (cathode and anode) at constant pressure and with different amounts of Fe2O3 nanoparticles. Calculations presented a reduction of the plasma emission intensity with the NPs content. Both the plasma density (calculated by Stark's broadening method) and the mean electron temperature (calculated using Boltzmann's equation) decreased with increasing the Fe2O3 nanoparticles dust content, which indicates clearly the effect of dust density on restricting
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