In the present work, a D.C. magnetron sputtering system was
designed and fabricated. This chamber of this system includes two
coaxial cylinders made from copper .the inner one used as a cathode
while the outer one used as a node. The magnetic coils located on
the outer cylinder (anode) .The profile of magnetic field for various
coil current (from 2Amp to 14Amp) are shown. The effect of
different magnetic field on the Cu thin films thickness at constant
pressure of 7x10-5mbar is investigated. The result shown that, the
electrical behavior of the discharge strongly depends on the values
of the magnetic field and shows an optimum value at which the
power absorbed by the plasma is maximum. Furthermore, the
pl

Air pollution is one of the important problems facing Iraq. Air pollution is the result of uncontrolled emissions from factories, car exhaust electric generators, and oil refineries and often reaches unacceptable limits by international standards. These pollutants can greatly affect human health and regular population activities. For this reason, there is an urgent need for effective devices to monitor the molecular concentration of air pollutants in cities and urban areas. In this research, an optical system has been built consisting of aHelium-Neonlaser,5mWand at 632.8 nm, a glass cell with a defined size, and a power meter(Gentec-E-model: uno) where a scattering of the laser beam occurs due to air pollution. Two pollutants were examin

      The current study involves an experimental investigation of plasma main parameters of a DC discharge with a hollow cathode (HCD) geometry in air using apertures of different diameters from the hollow cathode (1, 1.5, 2, and 2.5 cm). A tiny Langmuir probe is used to investigate the plasma properties. The HCD was operated at constant power of 12.4 W and gas pressures ranging between 0.1 to 0.8 torr. It was observed that the operational conditions strongly affect the electron temperature and density, while the hollow cathode diameter has not much influence. The main important observation was that at relatively high air pressure (>0.4 torr) two electron temperatures were obtained, while at relatively low pressure (<0.4 torr)

Cadmium oxide thin films were prepared by D.C magnetron plasma sputtering using different voltages (700, 800, 900, 1000, 1100 and 1200) Volt. The Cadmium oxide structural properties using XRD analysis for just a voltage of 1200 volt at room temperature after annealing in different temperatures (523 and 623) K were studied .The results show that the films prepared at room temperature have some peaks belong to cadmium element along the directions (002), (100), (102) and (103) while the other peaks along the directions of (111), (200) and (222) belong to cadmium oxide. Annealed samples display only cadmium oxide peaks. Also, the spectroscopic properties of plasma diagnostic for CdO thin films were determined and the results show that the el

    This work is an experimental study conducted to study the effects of iron oxide dust particles (Fe₂O₃) on the characteristics of DC discharge plasma in argon gas under vacuum. Electron temperature ( ) and electron density (n_e) were calculated by Boltzmann plots and Stark broadening, respectively. The results show that both the electron density and plasma frequency ( ) increased with the operating pressure. While,  and Debye length ( ) decreased with pressure. The glow discharge is more stable with the Fe₂O₃-dust particles; all dust plasma parameters have lower values  than those of the dust-free plasma.

Objectives Dental implant is a revolution in dentistry; some shortages are still a focus of research. This study use long duration of radiofrequency (RF)–magnetron sputtering to coat titanium (Ti) implant with hydroxyapatite (HA) to obtain a uniform, strongly adhered in a few micrometers in thickness. Materials and Methods Two types of substrates, discs and root form cylinders were prepared using a grade 1 commercially pure (CP) Ti rod. A RF–magnetron sputtering device was used to coat specimens with HA. Magnetron sputtering was set at 150 W for 22 hours at 100°C under continuous argon gas flow and substrate rotation at 10 rpm. Coat properties were evaluated via field emission scanning electron microscopy (FESEM), scanning electro

Ti6Al4V thin film was prepared on glass substrate by RF
sputtering method. The effect of RF power on the optical properties
of the thin films has been investigated using UV-visible
Spectrophotometer. It's found that the absorbance and the extinction
coefficient (k) for deposited thin films increase with increasing
applied power, while another parameters such as dielectric constant
and refractive index decrease with increasing RF power.

Background: Tonsillectomy is one of the most common surgical operations in otolaryngology, post-tonsillectomy hemorrhage is a dangerous complication. Several methods have been used to decrease the rate of post-tonsillectomy hemorrhage, one of these methods, a relatively recent method, is local application of platelet-rich plasma (PRP) to the tonsillar beds.

Objectives: To evaluate the role of local application of autologous PRP to the tonsillar beds, at the time of tonsillectomy, in post-tonsillectomy hemorrhage.

Patients and methods: A prospective comparative study enrolled 64 patients with ages ranging from 6 to 10 years who underwent tonsillectomy with or without adenoid

In this paper, Al and Cu Plasmas that produced by pulsed Nd:YAG laser with fundamental wave length with a pulse duration of 6 nS focused onto Al and Cu targets in atmospheric air are investigated spectroscopically. The influence of pulse laser energy on the some Al and Cu plasmas characteristics was diagnosed by using optical emission spectroscopy for the wavelength range 320-740 nm. The results observed that the increase of pulse laser energy causes to increase all plasma characteristics of both plasmas under study and shown increasing of the emission line intensity. The appearance of the atomic and ionic emission lines of an element in the emission spectrum depends on the ionization energy of target atoms. The plasma characteristics ar

TiO2 thin films were deposited by reactive d.c magnetron sputtering method on a glass substrate with various ratio of gas flow (Oxygen /Argon) (50/50, 100/50 and 150/50) at substrate temperature 573K. It can be observe that the optical energy gap of TiO2 thin films dependent on the ratio of gas flow (oxygen/argon), it varies between (3.45eV-3.57eV) also it is seen that the optical constants (α, n, K, εr and εi ) has been varied with the change of the ratio of gas flow (Oxygen /Argon).