ماجستير علوم فيزياء /مدرس
This study refers to the development and characterization of silver oxide nanoparticles obtained by X-ray diffraction, nanostructured silver oxide was used in order to calculate the micro strain and crystal size by Halder-Wagner method and by relying on X-ray diffraction diagram of the nonstructural silver oxide, where the results of the crystal size and the micro-strain were 4nm and 0.33 respectively. Other analysis techniques, such as the Size-strain plot, The X-ray diffraction study confirmed that the crystalline nature of silver oxide nanoparticles has a cubic structure. Through the X-ray diffraction results, the crystal size was calculated using Debye-Scherrer and Williamson-Hall methods. Halder-Wagner (HW), Size-strain plot, D
... Show MoreThe non-linear components has been emphasized for its multiple applications in rewritable recording and data storage devices. Chalcogenide glasses materials are promising due to their high refractive index. In this paper, alloys for Ge30Te70-xSbxglasses semiconductor (where x =0.0, 5, 10, 15 and 20) will be fabricated by melt quenching method. The effect of partial substitution on DC electric power parameters, and its knowledge of electrical conduction mechanisms, were investigated to determine the effect of Antimony on the density of extended states, local states, and in Fermi energy states. The electrical measurements revealed the existence of three conduction mechanis
... Show MorePsi prepared by Electrochemical etching technique at invariable etching current density of 10 mA/cm2 and at different times (7 and 17) min. The porous Si structure was studied using XRD, (FE-SEM) and EDS. The process of sensing NH3 gas is carried out at different operating temperatures (R.t,80,130 and 200)°C and the gas concentration is constant. It is measured by changing the resistance of the sensor as a function of exposure time to the gas. The result showed the XRD patterns of the PS at (7 and 17) min etching time. the peak samples at (111) around 2θ = 28.5°. It is observed that the peak intensity declines with rising the etching time,