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Nanocrystalline TiO
2
and CuO doped TiO
2
thin films were successfully deposited on
suitably cleaned glass substrate at constant room temperature and different concentrations of CuO
(0.05,0.1,0.15,0.2) wt% using pulse laser deposition(PLD) technique at a constant deposition parameter such
as : (pulse Nd:YAG laser with λ=1064 nm, constant energy 800 mJ, with repetition rate 6 Hz and No. of
pulse (500). The films were annealed at different annealing temperatures 423K and 523 K. The effect of
annealing on the morphological and electrical properties was studied. Surface morphology of the thin films
has been studied by using atomic force microscopes which showed that the films have good crystalline and
homogeneous surface. The Root M
...
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