A number of pulsed experiments have been carried out using a high-voltage circuit containing R,L, and C in certain arrangements. A spherical spark gap of steel electrodes was used as a high-current switch operated by a voltage of up to 8kV and triggered in both self-triggering and third-electrode triggering modes. Current measurements were carried out by using both current-viewing resistor and Rogowski coils designed for this purpose. Typical current waveforms have shown obvious dominating inductance effect of the circuit components in an underdamped oscillation. The behavior of the circuit impedance was studied by recording both pulsed current peaks and the charging voltages when currents of up to 2.5kA were recorded. The dur

In this work, an experimental research on a low voltage DC magnetron plasma sputtering (0-650) volt is used for coating gold on a glass substrate at a constant pressure of argon gas 0.2 mbar and deposition time of 30 seconds. We focused on the effects of operating conditions for the system such as, electrode separation and sputtering current on coated samples under the influence of magnetic flux. Electron temperature and electrons and ions densities are determined by a cylindrical single Langmuir probe. The results show the sensitivity of electrode separation lead to change the plasma parameters. Furthermore, the surface morphology of gold coated samples at different electrode separation and sputtering current were studied by atomic forc

     The effects of poles distances of a discharge tube (cathode and anode) were investigated. The distances(90,95,100,110,115,120,130,140)mm are considered. The influence of (25mT) parallel and (2mT) normal magnetic fields with respect to the discharge tube on electron temperature under a pressure of (6pascal) and (900volt) was studied by implementing double Langmuire probe into plasma. Curves fitting were performed to find the optimum values of electron temperature for all cases in this work.We found that the electron temperature as a function of poles distances is exponential form

In this research pulse high voltage circuit was used including resistance,
inductance and capacitor to achieve an experiment of cylindrically-tipped of plasma
switch .The charging voltage of up to 9kV using Rogowski coil and current-shunt
resistance (CVR) used to measure pulsed electrical discharge (PED). The current in
both self-triggering and third-electrode triggering modes. The pulsed current peaks
4kA and the duration of circuit pulses were recorded between 0.1μs and 0.3μs. The
experimental results has shown clearly the inductance effect in the circuit parts in
under damped oscillation regarding the value of circuit parts in addition to the
distance of the spark gap cylindrically-tipped electrodes during th

Titanium alloy (Ti-6Al-4V) samples were nitrided in low pressure (1.3, 3 mbar) dc-glow discharge plasmas of nitrogen. The treating time was 5, 10 and 15 hour and the temperatures range of the samples during the nitriding process was close to 800oC. The obtained microstructures of the nitride layers were studied by x-ray diffraction and optical microscopy. The ε –Ti2N, ζ-Ti3N3-x and η-Ti3N2-x.phases were formed and addition to the solid solution of nitrogen in titanium, α (Ti,N). Micro hardness measurements exhibit an increment for the Ti-alloy specimens which nitrided at 800oC for 10 and 15h.Corrosion measurements were obtained for the Ti-6Al-4V alloy in Ringer solution after plasma nitriding. The clear improving in the corrosion r

     Cadmium Selenide (CdSe) thin films have been deposited on a glass substrate utilizing the plasma DC-sputtering method at room temperature at different deposition time in order to achieve different films thickness, and studied its sensitivity to the  carbon monoxide CO gas which are show high response as the film thickness increases, the DC-conductivity and photoconductivity are also studied and which are increased too as the film thickness increases, that indicates the good semiconducting behavior at room  temperature and light environments.

In this paper the effect of nonthermal atmospheric argon plasma on the optical properties of the cadmium oxide CdO thin films prepared by chemical spray pyrolysis was studied. The prepared films were exposed to different time intervals (0, 5, 10, 15, 20) min. For every sample, the transmittance, Absorbance, absorption coefficient, energy gap, extinction coefficient and dielectric constant were studied. It is found that the transmittance and the energy gap increased with exposure time, and absorption. Absorption coefficient, extinction coefficient, dielectric constant decreased with time of exposure to the argon plasma

   In this paper, we investigate the basic characteristics of "magnetron sputtering plasma" using the target V₂O₅. The "magnetron sputtering plasma" is produced using "radio frequency (RF)" power supply and Argon gas. The intensity of the light emission from atoms and radicals in the plasma measured by using "optical emission spectrophotometer", and the appeared peaks in all patterns match the standard lines from NIST database and employed are to estimate the plasma parameters, of computes electron temperature and the electrons density. The characteristics of V₂O₅ sputtering plasma at multiple discharge provisos are studied at the "radio frequency" (RF) power ranging from 75 - 150 Wat

       In this study, the surface of the epoxy/Al composite is treated using a dielectric barrier discharge (DBD) plasma in the presence of air. The epoxy composite was prepared by mixing 0.1g and 0.3 g aluminum powder with epoxy resin and its hardener in a ratio of 3:1. The surface epoxy/Al composite as a dielectric barrier layer (DB) is studied at an applied frequency of 8 kHz and at three exposure times 0, 2, and 4 min. The UV degradation process has been studied using UV-Visible spectroscopy, for these polymers. The absorbance intensity in the UV region (200–320 nm) was high. The absorbance level decreased after 2 minutes and increased after 4 min exposure time. Before exposure to plasma, the epoxy/Al composite at 0.1 g Al ha