Effect of sputtering power on optical Properties of RF sputtering deposited Ti6Al4V Thin Films
Thin Films
RF Sputtering
Optical Properties
Ti6Al4V.
Ti6Al4V thin film was prepared on glass substrate by RF
sputtering method. The effect of RF power on the optical properties
of the thin films has been investigated using UV-visible
Spectrophotometer. It's found that the absorbance and the extinction
coefficient (k) for deposited thin films increase with increasing
applied power, while another parameters such as dielectric constant
and refractive index decrease with increasing RF power.
