Two unsupervised classifiers for optimum multithreshold are presented; fast Otsu and k-means. The unparametric methods produce an efficient procedure to separate the regions (classes) by select optimum levels, either on the gray levels of image histogram (as Otsu classifier), or on the gray levels of image intensities(as k-mean classifier), which are represent threshold values of the classes. In order to compare between the experimental results of these classifiers, the computation time is recorded and the needed iterations for k-means classifier to converge with optimum classes centers. The variation in the recorded computation time for k-means classifier is discussed.

    Image segmentation is a basic image processing technique that is primarily used for finding segments that form the entire image. These segments can be then utilized in discriminative feature extraction, image retrieval, and pattern recognition. Clustering and region growing techniques are the commonly used image segmentation methods. K-Means is a heavily used clustering technique due to its simplicity and low computational cost. However, K-Means results depend on the initial centres’ values which are selected randomly, which leads to inconsistency in the image segmentation results. In addition, the quality of the isolated regions depends on the homogeneity of the resulted segments. In this paper, an improved K-Means

In this paper, a design of the broadband thin metamaterial absorber (MMA) is presented. Compared with the previously reported metamaterial absorbers, the proposed structure provides a wide bandwidth with a compatible overall size. The designed absorber consists of a combination of octagon disk and split octagon resonator to provide a wide bandwidth over the Ku and K bands' frequency range. Cheap FR-4 material is chosen to be a substate of the proposed absorber with 1.6 thicknesses and 6.5×6.5 overall unit cell size. CST Studio Suite was used for the simulation of the proposed absorber. The proposed absorber provides a wide absorption bandwidth of 14.4 GHz over a frequency range of 12.8-27.5 GHz with more than %90 absorp

This study investigated the outcome of Alstonia boonei stem bark on liver enzymes after inducing the Wistar albino rats with carbon tetrachloride (CCl₄). This effect of plant extract was compared with silymarin – a drug commonly used for the treatment of chronic hepatocyte disorder. The plant sample was extracted with ethanol; acute toxicity study of the extract was performed on eighteen Wistar mice, while 30 rats were sacrificed for liver enzymes assay. The rats were divided into six clusters: each cluster has five rats, culster 1 served as control and was given 2 mL/kg b.w - distilled water; clusters 2 – 6 were CCl₄ induced. Cluster 2 was untreated but served as the negative control while cluster 3 wa

       Studies were conducted to evaluate the biological effects of the non-steroidal ecdysone agonist (Methoxyfenozide), on different developmental larval stages of cotton leafworm Spodoptera littoralis (Boisd.) in the laboratory. The results showed that the early larval stages were the most  susceptible to Methoxyfenozide which caused 100% mortality within 4-6 days after treatment at all used concentrations, while such percentage of mortality was achieved within 6 days after treatment for late larval stages when the highest concentration was used (0.2)g (ai) /L. Several morphological deformations were noticed on pupal stage, the results showed that the highest percentage of deformations was 1

In this research, the study effect of irradiation on structural and optical properties of thin film (CdO) by spray pyrolysis method, which deposited on glasses substrates at a thickness of (350±20)nm , The flow rate of solution was 5 ml/min and the substrate temperature was held constant at 400˚C.The investigation of (XRD) indicates that the (CdO) films are polycrystalline and type of cubic. The results of the measuring of each sample from grain size, micro strain, dislocation density and number of crystals the grain size decreasing after irradiation with gamma ray from(27.41, 26.29 ,23.63)nm . The absorbance and transmittance spectra have been recorded in the wavelength range (300-1100) nm in order to study the optical properties. the op

Copper oxide thin films were deposited on glass substrate using Successive Ionic Layer Adsorption and Reaction (SILAR) method at room temperature. The thickness of the thin films was around 0.43?m.Copper oxide thin films were annealed in air at (200, 300 and 400°C for 45min.The film structure properties were characterized by x-ray diffraction (XRD). XRD patterns indicated the presence of polycrystalline CuO. The average grain size is calculated from the X-rays pattern, it is found that the grain size increased with increasing annealing temperature. Optical transmitter microscope (OTM) and atomic force microscope (AFM) was also used. Direct band gap values of 2.2 eV for an annealed sample and (2, 1.5, 1.4) eV at 200, 300,400oC respect

In the present work, the effect of isolated dust particles (FeO) with radius of the grain 0.1μm - 0.5μm of main plasma characteristics are investigated experimentally in direct current system by using magnetic field. The present of dust particle in the air plasma did effect on Paschen minimum and on the plasma properties in low pressure region. The effect of dust particles on discharge voltage, discharge current, plasma potential, floating potential, electron density, electron temperature and Debye length was investigation by using magnetic field. The measurements of parameters are taken by four cylindrical Langmuir probes. The results show the present of dust causes decreasing in discharge voltage with increase pressure while the disc

A thin CdS Films have been evaporated by thermal evaporation technique with different thicknesses (500, 1000, 1500 and 2000Å) and different duration times of annealing (60, 120 180 minutes) under 573 K annealing temperature, the vacuum was about 8 × 10-5 mbar and substrate temperature was 423 K. The structural properties of the films have been studied by X- ray diffraction technique (XRD). The crystal growth became stronger and more oriented as the film thickness (T) and duration time of annealing ( Ta) increases.