The significance of the work is to introduce the new class of open sets, which is said Ǥ- -open set with some of properties. Then clarify how to calculate the boundary area for these sets using the upper and lower approximation and obtain the best accuracy.
In this paper we show that the function , () p fLI α ∈ ,0<p<1 where I=[-1,1] can be approximated by an algebraic polynomial with an error not exceeding , 1 ( , , ) kp ft n ϕ αω where
,
1 ( , , ) kp ft n ϕ αω is the Ditizian–Totik modules of smoothness of unbounded function in , () p LI
For any group G, we define G/H (read” G mod H”) to be the set of left cosets of H in G and this set forms a group under the operation (a)(bH) = abH. The character table of rational representations study to gain the K( SL(2,81)) and K( SL(2, 729)) in this work.
A factor group is a mathematical group obtained by aggregating similar elements of a larger group using an equivalence relation that preserves some of the group structure. In this paper, the factor groups K(SL(2,121)) and K(SL(2,169)) computed for each group from the character table of rational representations.
The group for the multiplication of closets is the set G|N of all closets of N in G, if G is a group and N is a normal subgroup of G. The term “G by N factor group” describes this set. In the quotient group G|N, N is the identity element. In this paper, we procure K(SL(2,125)) and K(SL(2,3125)) from the character table of rational representations for each group.
Abstract. In this work, Bi2O3 was deposited as a thin film of different thickness (400, 500, and 600 ±20 nm) by using thermal oxidation at 573 K with ambient oxygen of evaporated bismuth (Bi) thin films in a vacuum on glass substrate and on Si wafer to produce n-Bi2O3/p-Si heterojunction. The effect of thickness on the structural, electrical, surface and optical properties of Bi2O3 thin films was studied. XRD analysis reveals that all the as deposited Bi2O3 films show polycrystalline tetragonal structure, with preferential orientation in the (201) direction, without any change in structure due to increase of film thickness. AFM and SEM images are used to investigate the influences of film thickness on surface properties. The optical measur
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