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In this work, Titanium oxide thin films doped with different concentration of CuO (0,5,10, 15,20)
%wt were prepared by pulse laser deposition(PLD) technique on glass substrates at room temperature with
constant deposition parameter such as : pulse (Nd:YAG), laser with λ=1064 nm, constant energy 800 mJ ,
repetition rate 6 Hz and No. of pulse (500). The structure , optical and electrical properties were studied . The
results of X-ray diffraction( XRD) confirmed that the film grown by this technique have good crystalline
tetragonal mixed anatase and rutile phase structure, The preferred orientation was along (110) direction for
Rutile phase. The optical properties of the films were studied by UV-VIS spectrum in the range of (360-1100)
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