Tin:antimony oxides composites have given great attention due to their unique properties and many application in various fields like optoelectronic devices, gas sensors. The synthesis and characterization of (SnO2)1-x(Sb2O3)x was conducted in order to comprehend the structure and discuss the optical and dielectric properties of this composites. The x-ray showed that the prepared pure tin oxide thin film was had a polycrystalline structure and that the peaks were identical with the tetragonal phase while the peaks were identical with antimony oxide for x=0.1 to x=0.5. The average crystal size along the preferred level of growth of tin oxide as well as of antimony oxide showed non regular change by increasing of antimony oxide content. Optical measurements showed that the prepared films(SnO2)1-x(Sb2O3)x had a direct Eg opt energy gap of 3.75 eV, which showed a non- regular increasing to 3.95 eV with the increase of antimony oxide content from x = 0.0 to x = 0.5. Dielectric and electrical impedance properties of (SnO2)1-x(Sb2O3)x composites were studied over the frequency range from 1kHz to 200kHz. The results showed that the dielectric properties of (SnO2)1-x(Sb2O3)x composites and showed significant dependence upon frequency. The frequency dependence type of AC conductivity obeys the Jonscher’s power law.
Tin oxide films (SnO2) of thickness (1 ?m) are prepared on glass substrate by post oxidation of metal films technique. Films were irradiated with Nd:YAG double frequency laser of wavelength (532 nm) pulses of three energies (100, 500, 1000) mJ. The optical absorption, transmission, reflectance, refractive index and optical conductivity of these films are investigated in the UV-Vis region (200-900) nm. It was found that the average transmittance of the films is around (80%) at wavelength (550 nm) and showed high transmission (? 90 %) in the visible and near infrared region. The absorption edge shifts towards higher energies, which is due to the Moss-Burstien effect and it lies at (4 eV). The optical band gap increased with increasing of ene
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We report about multilayer (TiO2)1-x(WO3)x thin films with various tungsten oxide concentration deposited on glass substrate via pulsed laser deposition (PLD) technique method. The structural, optical and dielectric properties of the prepared thin films were characterized using x-ray diffraction method (XRD) and UV-Visible absorption spectrometry and LRC meter. The x-ray results showed a polycrystalline structure of pristine titanium oxide and the peaks are identical with the rutile phase and trace of the anatase phase. These peaks are identical with titanium oxide and triclinic tungsten oxide as WO3 is added to TiO2 while it was observed that all peaks belong to tungsten oxide at x=1.0. Th
... Show MoreIn this work, HgBa2CaCu2-xSbxO8+δ compounds with (x = 0.2, 0.4, 0.6 and 0.8) have been prepared by the solid-state reaction method. Structural, morphological, and electrical properties were investigated using X-ray diffraction (XRD) and scanning electron microscope (SEM) techniques. Using the 4-probe technique to study the effect of antimony-substitution for Copper on the electrical properties of HgBa2CaCu2-xSbxO8+δ (Hg-1212) phase was investigated by measuring the resistivity as a function of temperature. Results indicate that the addition of antimony (Sb) increases the volume fraction of the phase and changes the superconducting transition temperature Tc of the superconductor to a normal state. The dielectric loss factor and ac
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Abstract : Tin oxide SnO2 films were prepared by atmospheric chemical vapor deposition (APCVD) technique. Our study focus on prepare SnO2 films by using capillary tube as deposition nozzle and the effect of these tubes on the structural properties and optical properties of the prepared samples. X-ray diffraction (XRD) was employed to find the crystallite size. (XRD) studies show that the structure of a thin films changes from polycrystalline to amorphous by increasing the number of capillary tubes used in sample preparation. Maximum transmission can be measured is (95%) at three capillary tube. (AFM) where use to analyze the morphology of the tin oxides surface. Roughness and average grain size for different number of capillary tubes have b
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Copper oxide thin films were synthesized by using spray pyrolysis deposition technique, in the temperature around 400°C in atmosphere from alcoholic solutions. Copper (II) chloride as precursor and glass as a substrate. The textural and structural properties of the films were characterized by atomic force microscopy (AFM), X-ray diffraction (XRD). The average particle size determined from the AFM images ranged from 30 to 90 nm and the roughness average was equal to 9.3 nm. The XRD patterns revealed the formation of a polycrystalline hexagonal CuO. The absorption and transmission spectrum, band gap, film thickness was investigated. The films were tested as an |
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Powders for (TiO 2 ) 1−x(MoO 3 ) x composites have been prepared with the use of a dry mix of TiO2 and MoO3 oxides with a variety of compositions (x = 0, 0.2, 0.4, 0.6, 0.8, and 1), then sintering at 1473 K. The materials have been ground and formed into pellets so that they could be used as targets for the pulsed laser deposition (PLD) process, which produced thin flms with a thickness of ≈150 nm on a glass substrate. When MoO3 is added to TiO2 , the crystal size has been observed to decrease from 33.3 to 25.8 nm, yet it after that continued to expand as MoO3 was added. The molybdenum ions were confrmed by XRD patterns, indicating that the substitution regarding Mo+6 ions for Ti +4 ions in TiO2 matrix is what is re
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The present work focuses on the changing of the structural characteristics of the grown materials through different material characterization methods. Semiconductor CdSxSe 1-x nano crystallines have been synthesized by chemical vapor depostion. (X- ray Diffraction; XRD), (Field Emission Scanning Electron Microscopy; FESEM), measured the characterization of Semiconductor CdSxSe1-x nano crystallines. The optical properties of semiconductor CdSxSe1-x nanocrystallines have been studied by the photoluminescence (PL) (He-Cd pulsed ultraviolet laser at 325nm excitation wavelength) at room temperature. The results showed the change rule of photoluminsence peak at different S
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In this paper Alx Ga1-x As:H films have been prepared by using new deposition method based on combination of flash- thermal evaporation technique. The thickness of our samples was about 300nm. The Al concentration was altered within the 0 x 40.
The results of X- ray diffraction analysis (XRD) confirmed the amorphous structure of all AlXGa1-x As:H films with x 40 and annealing temperature (Ta)<200°C. the temperature dependence of the DC conductivity GDC with various Al content has been measured for AlXGa1-x As:H films.
We have found that the thermal activation energy Ea depends of Al content and Ta, thus the value of Ea were approximately equal to half the value of optical gap.