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Influence of Cylindrical Electrode Configuration on Plasma Parameters in a Sputtering System
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      In the present work, the effect of the cylindrical configurations of the sputtering device electrodes on the plasma parameters (Debye length, electron temperature, electron density, plasma frequency) is studied. Also, the effect of the argon gas pressure on the discharge properties is examined with gas pressures of (0.08, 0.2, 0.4 and 0.6) Torr. The properties of the plasma are diagnosed by optical emission spectrometry. The spectroscopic method is adopted for examining the atomic spectra of argon emission.  The electron temperature is determined by the Boltzmann method. While, the Stark-widening method was employed for calculating the electron number density. The voltage against current curves of the cylindrical sprayer discharges shows the voltage to be nearly constant with slight increase in current. An increase in pressure causes the cathode cascades to compress and the negative glow to become thinner and more luminous. Plasma properties such as electron temperature and Debye length  decrease with increasing pressure, while electron number density and plasma frequency increase.

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Publication Date
Sun Jul 31 2022
Journal Name
Iraqi Journal Of Science
Influence of Fe2O3 Dust Particles on the Plasma Characteristics of D.C Sputtering System
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    This work is an experimental study conducted to study the effects of iron oxide dust particles (Fe2O3) on the characteristics of DC discharge plasma in argon gas under vacuum. Electron temperature ( ) and electron density (ne) were calculated by Boltzmann plots and Stark broadening, respectively. The results show that both the electron density and plasma frequency ( ) increased with the operating pressure. While,  and Debye length ( ) decreased with pressure. The glow discharge is more stable with the Fe2O3-dust particles; all dust plasma parameters have lower values  than those of the dust-free plasma.

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Publication Date
Sun Jan 13 2019
Journal Name
Iraqi Journal Of Physics
Spectroscopic study for plasma parameters in co-sputtering system
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In this work the parameters of plasma (electron temperature Te,
electron density ne, electron velocity and ion velocity) have been
studied by using the spectrometer that collect the spectrum of
plasma. Two cathodes were used (Si:Si) P-type and deposited on
glass. In this research argon gas has been used at various values of
pressures (0.5, 0.4, 0.3, and 0.2 torr) with constant deposition time
4 hrs. The results of electron temperature were (31596.19, 31099.77,
26020.14 and 25372.64) kelvin, and electron density (7.60*1016,
8.16*1016, 6.82*1016 and 7.11*1016) m-3. Optical properties of Si
were determined through the optical transmission method using
ultraviolet visible spectrophotometer with in the range
(

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Publication Date
Fri Mar 01 2013
Journal Name
International Journal Of Recent Research And Review
Influence of Discharge Pressure on the Plasma Parameter in a Planar Dc-Sputtering Discharge of Argon
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Abstract- Plasma parameters in a planar dc-sputtering discharge in argon were measured by cylindrical electrostatic probe (Langmuir probe).Electron density, electron temperature, floating potential, and space potential were monitored as a function of working discharge pressure. Electrostatic probe and supporting circuit were described and used to plot the current – voltage characteristics. Plasma properties were inferred from the current-voltage characteristics of a single probe positioned at the inter-cathode space. Typical values are in the range of (10-16 -10-17) m-3 and (2.93 – 5.3) eV for the electron density and the electron temperature respectively.

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Publication Date
Fri Oct 01 2010
Journal Name
Iraqi Journal Of Physics
The axial profile of plasma characteristics of cylindrical magnetron sputtering device
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In the present work, a d.c. magnetron sputtering system was designed and fabricated. The chamber of this system was includes from two copper coaxial cylinders where the inner one used as a cathode (target) while the outer one used as the anode with Solenoid magnetic coil located on the outer cylinder (anode). The axial profile of magnetic field for various coil current (from 2A to 14 A) are shown. The plasma characteristics in the normal glow discharge region are diagnostics by the 2.2mm diameter Langmuir probe with different length along the cathode and located at different radial positions 1cm and 2cm from the cathode surface. The result of this work shows that, the electron energy distributions at different radial positions along the

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Publication Date
Fri Oct 01 2010
Journal Name
Iraqi Journal Of Physics
Investigation of plasma characteristics of center region of post cylindrical magnetron sputtering device
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A d.c. magnetron sputtering system was designed and fabricated. The chamber of this system is consisted from two copper coaxial cylinders. The inner one used as the cathode and the outer one used as anode with magnetic coil located on the outer cylinder (anode). The axial behavior of the magnetic field strength along the cathode surface for various coil current (from 2A to 14A) are shown. The results of this work are investigated by three cylindrical Langmuir probes that have different diameters that are 2.2mm, 1mm, and 0.45mm. The results of these probes show that, there are two Maxwellian electron groups appear in the central region. As well as, the density of electron and ion decreases with increases of magnetic field strengths.

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Publication Date
Tue Oct 02 2018
Journal Name
Iraqi Journal Of Physics
Effect of electrode separation in magnetron DC plasma sputtering on grain size of gold coated samples
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In this work, an experimental research on a low voltage DC magnetron plasma sputtering (0-650) volt is used for coating gold on a glass substrate at a constant pressure of argon gas 0.2 mbar and deposition time of 30 seconds. We focused on the effects of operating conditions for the system such as, electrode separation and sputtering current on coated samples under the influence of magnetic flux. Electron temperature and electrons and ions densities are determined by a cylindrical single Langmuir probe. The results show the sensitivity of electrode separation lead to change the plasma parameters. Furthermore, the surface morphology of gold coated samples at different electrode separation and sputtering current were studied by atomic forc

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Publication Date
Tue May 01 2012
Journal Name
Iraqi Journal Of Physics
Influence of grounded electrode area on breakdown current in RF capcitively coupled plasma
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The influence of the grounded electrode area on the ignition voltage in capcitively coupled radio frequency discharge at 13.56 MHz in argon gas is studied experimentally. The results indicate a systematic decrease of the breakdown voltage with increasing grounded electrode area for the same pd value. Results show that the secondary ionization coefficient γ increases with the increase of grounded electrode area. Furthermore, results also the discharge current at the breakdown voltage increases almost linearly with the increase of electrode area suggesting an almost constant current density.

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Publication Date
Thu Dec 23 2021
Journal Name
Iraqi Journal Of Science
Electrical Properties and Optimum Conditions of A Home-Made Magnetron Plasma Sputtering System
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     In this work, the electrical properties and optimum conditions of the plasma sputtering system have been studied. The electrical properties such as Paschen's curve, current-voltage, current pressure relations, the strength of magnetic field as a function of inter-electrode distance, the influence of gas working pressure and argon-oxygen ratio on the electrical characterization were studied to determine the basic optimum condition of the system operation. the discharge current as a function of discharge voltage showed high discharge current at 2.5 cm.  These parameters represent the basic conditions to operate any plasma sputtering system which are the right behavior to build up and design the discharge an el

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Publication Date
Wed Dec 30 2009
Journal Name
Iraqi Journal Of Physics
Preparation of Cu thin film by cylindrical magnetron sputtering device
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In the present work, a D.C. magnetron sputtering system was
designed and fabricated. This chamber of this system includes two
coaxial cylinders made from copper .the inner one used as a cathode
while the outer one used as a node. The magnetic coils located on
the outer cylinder (anode) .The profile of magnetic field for various
coil current (from 2Amp to 14Amp) are shown. The effect of
different magnetic field on the Cu thin films thickness at constant
pressure of 7x10-5mbar is investigated. The result shown that, the
electrical behavior of the discharge strongly depends on the values
of the magnetic field and shows an optimum value at which the
power absorbed by the plasma is maximum. Furthermore, the
pl

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Publication Date
Sun Oct 30 2022
Journal Name
Iraqi Journal Of Science
The Influence of the Magnetic Field on the Plasma Characteristics in Hollow Electrodes Discharge System
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      This work is an experimental study about the effects of gas pressure and magnetic field on plasma characteristics produced in an internal hollow electrodes discharge (HED) system. The results show that the breakdown voltage values increase with increasing the working pressure (especially with the presence of a magnetic field). The breakdown voltage depends on the p.d. product, where p is the gas pressure and d is the distance between the electrodes. While the values of current discharge decrease with the increase of the working pressure. The temperature of electron and the number density of electron are calculated from the Boltzmann method and the broadening of Stark, respectively. The results showed that the electron number d

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